sputtering
41plasma sputtering — Смотри плазменное распыление …
42cathodic sputtering — Смотри катодное распыление …
43vacuum spraying (sputtering) — Смотри вакуумное распыление …
44Sputter deposition — is a physical vapor deposition (PVD) method of depositing thin films by sputtering, that is ejecting, material from a target, that is source, which then deposits onto a substrate, such as a silicon wafer. Resputtering is re emission of the… …
45Металлизация распылением — Sputtering Металлизация распылением. Бомбардировка твердой поверхности потоком энергетических частиц (ионов), приводящая к выбросу атомов. Этот метод может использоваться как источник для нанесения металла. (Источник: «Металлы и сплавы.… …
46Pulvérisation cathodique — Pour les articles homonymes, voir Pulvérisation. La pulvérisation cathodique (ou sputtering) est une méthode de dépôt de couche mince. Il s agit d une technique qui autorise la synthèse de plusieurs matériaux à partir de la condensation d’une… …
47Vera Yurasova — is a Russian physicist who has made major contributions to the study of the processes of interactions between ion beams and solid surfaces, both their experimental characteristics and their physical mechanisms.Vera Yurasova was born in Moscow on… …
48radiation — radiational, adj. /ray dee ay sheuhn/, n. 1. Physics. a. the process in which energy is emitted as particles or waves. b. the complete process in which energy is emitted by one body, transmitted through an intervening medium or space, and… …
49Pulverisation cathodique — Pulvérisation cathodique La pulvérisation cathodique est une méthode de dépôt de couche mince. Sommaire 1 Principe 1.1 Synthèse de films céramiques 1.2 Instabilité électrique …
50Copper indium gallium selenide solar cells — Copper indium gallium selenide (CuIn1 xGaxSe2 or CIGS) is a direct bandgap semiconductor useful for the manufacture of solar cells. Because the material strongly absorbs sunlight, a much thinner film is required than of other semiconductor… …