- molecular-beam deposition
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молекулярно-пучковое осаждение
Англо-русский словарь технических терминов. 2005.
molecular-beam deposition
Смотреть что такое "molecular-beam deposition" в других словарях:
molecular-beam deposition — molekulpluoštis nusodinimas statusas T sritis radioelektronika atitikmenys: angl. molecular beam deposition vok. Molekularstrahlabscheidung, f rus. молекулярно пучковое осаждение, n pranc. dépôt à jet moléculaire, m; dépôt par jet moléculaire, m … Radioelektronikos terminų žodynas
Molecular-beam epitaxy — (MBE), is one of several methods of depositing single crystals. It was invented in the late 1960s at Bell Telephone Laboratories by J. R. Arthur and Alfred Y. Cho.MethodMolecular beam epitaxy takes place in high vacuum or ultra high vacuum (10−8… … Wikipedia
Molecular beam epitaxy — A simple sketch showing the main components and rough layout and concept of the main chamber in a Molecular Beam Epitaxy system Molecular beam epitaxy (MBE) is one of several methods of depositing single crystals. It was invented in the late… … Wikipedia
Molecular nanotechnology — Part of a series of articles on Molecular Nanotechnology … Wikipedia
Chemical beam epitaxy — (CBE) forms an important class of deposition techniques for semiconductor layer systems, especially III V semiconductor systems. This form of epitaxial growth is performed in an ultrahigh vacuum system. The reactants are in the form of molecular… … Wikipedia
Thin-film deposition — is any technique for depositing a thin film of material onto a substrate or onto previously deposited layers. Thin is a relative term, but most deposition techniques allow layer thickness to be controlled within a few tens of nanometers, and some … Wikipedia
Pulsed laser deposition — (PLD) is a thin film deposition (specifically a physical vapor deposition, PVD) technique where a high power pulsed laser beam is focused inside a vacuum chamber to strike a target of the desired composition. Material is then vaporized from the… … Wikipedia
Evaporation (deposition) — Evaporation machine used for metallization at LAAS technological facility in Toulouse, France. Evaporation is a common method of thin film deposition. The source material is evaporated in a vacuum. The vacuum allows vapor particles to travel… … Wikipedia
Physical vapor deposition — Der Begriff physikalische Gasphasenabscheidung (englisch physical vapour deposition, kurz PVD) bezeichnet eine Gruppe von vakuumbasierten Beschichtungsverfahren bzw. Dünnschichttechnologien, bei denen im Gegensatz zu CVD Verfahren die Schicht… … Deutsch Wikipedia
Physical vapour deposition — Der Begriff physikalische Gasphasenabscheidung (englisch physical vapour deposition, kurz PVD) bezeichnet eine Gruppe von vakuumbasierten Beschichtungsverfahren bzw. Dünnschichttechnologien, bei denen im Gegensatz zu CVD Verfahren die Schicht… … Deutsch Wikipedia
Ion Beam Mixing — is a process for adhering two multilayers, especially a substrate and deposited surface layer. The process involves bombarding layered samples with doses of ion radiation in order to promote mixing at the interface, and generally serves as a… … Wikipedia
