solid photoresist
1solid photoresist — sausasis fotorezistas statusas T sritis radioelektronika atitikmenys: angl. dry photoresist; solid photoresist vok. Trockenresist, n rus. сухой фоторезист, m pranc. photorésist sec, m …
2photorésist sec — sausasis fotorezistas statusas T sritis radioelektronika atitikmenys: angl. dry photoresist; solid photoresist vok. Trockenresist, n rus. сухой фоторезист, m pranc. photorésist sec, m …
3Photoresist — A photoresist is a light sensitive material used in several industrial processes, such as photolithography and photoengraving to form a patterned coating on a surface. Contents 1 Photoresist categories 1.1 Tone 1.2 Developing light wavelength …
4dry photoresist — sausasis fotorezistas statusas T sritis radioelektronika atitikmenys: angl. dry photoresist; solid photoresist vok. Trockenresist, n rus. сухой фоторезист, m pranc. photorésist sec, m …
5Trockenresist — sausasis fotorezistas statusas T sritis radioelektronika atitikmenys: angl. dry photoresist; solid photoresist vok. Trockenresist, n rus. сухой фоторезист, m pranc. photorésist sec, m …
6sausasis fotorezistas — statusas T sritis radioelektronika atitikmenys: angl. dry photoresist; solid photoresist vok. Trockenresist, n rus. сухой фоторезист, m pranc. photorésist sec, m …
7сухой фоторезист — sausasis fotorezistas statusas T sritis radioelektronika atitikmenys: angl. dry photoresist; solid photoresist vok. Trockenresist, n rus. сухой фоторезист, m pranc. photorésist sec, m …
8materials science — the study of the characteristics and uses of various materials, as glass, plastics, and metals. [1960 65] * * * Study of the properties of solid materials and how those properties are determined by the material s composition and structure, both… …
9Multiple patterning — is a class of technologies developed for photolithography to enhance the feature density. The simplest case of multiple patterning is double patterning, where a conventional lithography process is enhanced to produce double the expected number of …
10Double patterning — is a class of technologies developed for photolithography to enhance the feature density. For the semiconductor industry, double patterning is the only lithography technique to be used for the 32 nm and 22 nm half pitch nodes in 2008 2009 and… …
