proximity correction

  • 1Optical Proximity Correction — Correction optique de proximité La Correction optique de proximité ou OPC (pour Optical proximity correction) est une technique d amélioration de la photolithographie communément utilisée pour compenser les erreurs dues à la diffraction ou aux… …

    Wikipédia en Français

  • 2Optical proximity correction — An illustration of optical proximity correction. The blue Γ like shape is what we d like printed on the wafer, in green is the shape after applying optical proximity correction, and the red contour is how the shape actually prints (quite close to …

    Wikipedia

  • 3Optical Proximity Correction — (deutsch etwa: optische Nahbereichskorrektur), meistens durch OPC abgekürzt, ist ein datentechnisches Verfahren in der Halbleitertechnologie zur Verbesserung der Abbildungsleistung fotolithografischer Prozesse. Dabei werden Verzerrungen der… …

    Deutsch Wikipedia

  • 4Optical proximity correction — Abbildungsfehler ohne OPC und Verbesserung mit OPC Strukturen in der Fotomaske (Schema) Optical proximity correction (OPC, englisch, deutsch etwa: optische Nahbereichskorrektur) ist in der Halbleitertechnik ein Verfahren zur Korrektur bzw.… …

    Deutsch Wikipedia

  • 5Correction optique de proximité — La Correction optique de proximité ou OPC (pour Optical proximity correction) est une technique d amélioration de la photolithographie communément utilisée pour compenser les erreurs dues à la diffraction ou aux effets liés au procédé de… …

    Wikipédia en Français

  • 6Concatenated error correction code — In coding theory, concatenated codes form a class of error correcting codes that are derived by combining an inner code and an outer code. They were conceived in 1966 by Dave Forney as a solution to the problem of finding a code that has both… …

    Wikipedia

  • 7Computational lithography — (also known as computational scaling) is the set of mathematical and algorithmic approaches designed to improve the resolution attainable through photolithography. Computational lithography has come to the forefront of photolithography in 2008 as …

    Wikipedia

  • 8Next-generation lithography — (NGL) is a term used in integrated circuit manufacturing to describe the lithography technologies slated to replace photolithography. As of 2009 the most advanced form of photolithography is immersion lithography, in which water is used as an… …

    Wikipedia

  • 9Nanolithography — Part of a series of articles on Nanoelectronics Single molecule electronics …

    Wikipedia

  • 10Фотолитография — Линия фотолитографии для производства кремниевых пластин Фотолитография метод получения рисунка на тонкой плёнке материала, широко используется в микроэлектронике и в полиграфии. Один из …

    Википедия