projection electron-beam lithography
1Electron beam lithography — (often abbreviated as e beam lithography) is the practice of scanning a beam of electrons in a patterned fashion across a surface covered with a film (called the resist),cite book |last= McCord |first=M. A. |coauthors=M. J. Rooks |title=… …
2electron-beam lithography projector — elektronpluoštės litografijos projektorius statusas T sritis radioelektronika atitikmenys: angl. e beam lithography projector; electron beam lithography projector vok. Elektronenbildprojektor, m; Elektronenstrahlbildprojektor, m rus. установка… …
3electron-beam projection lithography — elektronpluoštė projekcinė litografija statusas T sritis radioelektronika atitikmenys: angl. electron projection lithography; electron beam projection lithography vok. Elektronenbildprojektion, f; Elektronenstrahlprojektionsverfahren, n rus.… …
4e-beam lithography projector — elektronpluoštės litografijos projektorius statusas T sritis radioelektronika atitikmenys: angl. e beam lithography projector; electron beam lithography projector vok. Elektronenbildprojektor, m; Elektronenstrahlbildprojektor, m rus. установка… …
5demagnifying electron-beam projection lithography — mažinamoji elektronpluoštė projekcinė litografija statusas T sritis radioelektronika atitikmenys: angl. demagnifying electron beam projection lithography vok. Projektion durch Elektronenbestrahlung mit Abbildungsverkleinerung, f rus. электронно… …
6Electron — For other uses, see Electron (disambiguation). Electron Experiments with a Crookes tube first demonstrated the particle nature of electrons. In this illustration, the profile of the cross shaped target is projected against the tube face at right… …
7Électron — Traduction à relire Electron → …
8electron projection lithography — elektronpluoštė projekcinė litografija statusas T sritis radioelektronika atitikmenys: angl. electron projection lithography; electron beam projection lithography vok. Elektronenbildprojektion, f; Elektronenstrahlprojektionsverfahren, n rus.… …
9Next-generation lithography — (NGL) is a term used in integrated circuit manufacturing to describe the lithography technologies slated to replace photolithography. As of 2009 the most advanced form of photolithography is immersion lithography, in which water is used as an… …
10Extreme ultraviolet lithography — (also known as EUV or EUVL ) is a next generation lithography technology using the 13.5 nm EUV wavelength. EUVL opticsEUVL is a significant departure from the deep ultraviolet lithography used today. All matter absorbs EUV radiation. Hence, EUV… …
