printing mask
101Next-generation lithography — (NGL) is a term used in integrated circuit manufacturing to describe the lithography technologies slated to replace photolithography. As of 2009 the most advanced form of photolithography is immersion lithography, in which water is used as an… …
102Depth of field — The area within the depth of field appears sharp, while the areas in front of and beyond the depth of field appear blurry …
103Mein Kampf —   Most common cover of Mein Kampf …
104Pixel — This article is about the picture element. For other uses, see Pixel (disambiguation). This example shows an image with a portion greatly enlarged, in which the individual pixels are rendered as little squares and can easily be seen …
105Solder paste — (or solder cream) is used for connecting the terminations of the IC packages with that of land patterns on the PCB. The paste is applied to the lands by printing the solder using a stencil, while other methods like screening and dispensing are… …
106Japanese literature — Introduction the body of written works produced by Japanese authors in Japanese or, in its earliest beginnings, at a time when Japan had no written language, in the Chinese classical language. Both in quantity and quality, Japanese… …
107Sailor Moon — This article is about the media franchise. For the title character, see Sailor Moon (character). For other uses, see Sailor Moon (disambiguation). Sailor Moon …
108Teenage Mutant Ninja Turtles — TMNT redirects here. For the 2007 film, see TMNT (film). For other uses, see Teenage Mutant Ninja Turtles (disambiguation). Teenage Mutant Ninja Turtles Clockwise from top: Leonardo, Michelangelo, Donatello, and Raphael Publication information …
109V for Vendetta (film) — ] There is even a brief scene (during the Valerie flashback) that contains real life footage of an anti Iraq war demonstration, with mention of President George W. Bush. Finally, the film contains references to America s war and the war America… …
110Extreme ultraviolet lithography — (also known as EUV or EUVL ) is a next generation lithography technology using the 13.5 nm EUV wavelength. EUVL opticsEUVL is a significant departure from the deep ultraviolet lithography used today. All matter absorbs EUV radiation. Hence, EUV… …
