metal deposition
21Chemical vapour deposition — Unter dem Begriff chemische Gasphasenabscheidung (englisch chemical vapor deposition, CVD) versteht man eine Gruppe von Beschichtungsverfahren, welche unter anderem bei der Herstellung von mikroelektronischen Bauelementen eingesetzt werden.… …
22Electron beam physical vapor deposition — Traduction à relire Electron beam physical vapor deposition → …
23Chemical Vapor Deposition (journal) — Chemical Vapor Deposition   Titre abrégé Chem. Vap. Deposition CVD Discipline …
24Plasma-enhanced chemical vapor deposition — PECVD machine at LAAS technological facility in Toulouse, France. Plasma enhanced chemical vapor deposition (PECVD) is a process used to deposit thin films from a gas state (vapor) to a solid state on a substrate. Chemical reactions are involved… …
25Chemical Solution Deposition — Der englische Begriff chemical solution deposition (CSD, dt. ‚chemische Abscheidung aus der Lösung‘, ‚chemische Lösungsabscheidung‘) bezeichnet eine Gruppe von (chemischen) Beschichtungsverfahren, bei denen ein Substrat zunächst mit in einer… …
26Cathodic arc deposition — or Arc PVD is a physical vapor deposition technique in which an electric arc is used to vaporize material from a cathode target. The vaporized material then condenses on a substrate, forming a thin film. The technique is can be used to deposit a… …
27Atomic layer deposition — (ALD) is a gas phase chemical process used to create extremely thin coatings. The majority of ALD reactions use two chemicals, typically called s. These precursors react with a surface one at a time in a sequential manner. By exposing the… …
28Amorphous metal — Samples of amorphous metal, with millimeter scale An amorphous metal is a metallic material with a disordered atomic scale structure. In contrast to most metals, which are crystalline and therefore have a highly ordered arrangement of atoms,… …
29Transactions of the Institute of Metal Finishing —   Titre abrégé Trans. Inst. Metal Finish. Discipline …
30Metalorganic chemical vapor deposition — (MOCVD) is a chemical vapor deposition process that uses metalorganic source gases. For instance, MOCVD may use tantalum ethoxide (Ta(OC 2H 5) 5), to create tantalum pentoxide (Ta 2O 5), or Tetrakis Dimethyl Amino Titanium(IV) (TDMAT) to create… …
