ion-implantation mask

  • 1ion-implantation mask — jonų implantavimo kaukė statusas T sritis radioelektronika atitikmenys: angl. ion implantation mask vok. Ionenimplantationsmaske, f rus. маска для ионной имплантации, f pranc. masque d implantation ionique, m …

    Radioelektronikos terminų žodynas

  • 2Ion beam — An ion beam is a type of particle beam consisting of ions. Ion beams have many uses in electronics manufacturing (principally ion implantation) and other industries. Today s ion beam sources are typically derived from the mercury vapor thrusters… …

    Wikipedia

  • 3masque d'implantation ionique — jonų implantavimo kaukė statusas T sritis radioelektronika atitikmenys: angl. ion implantation mask vok. Ionenimplantationsmaske, f rus. маска для ионной имплантации, f pranc. masque d implantation ionique, m …

    Radioelektronikos terminų žodynas

  • 4Deep reactive-ion etching — (DRIE) is a highly anisotropic etch process used to create deep penetration, steep sided holes and trenches in wafers, with aspect ratios of 20:1 or more. It was developed for microelectromechanical systems (MEMS), which require these features,… …

    Wikipedia

  • 5Ionenimplantationsmaske — jonų implantavimo kaukė statusas T sritis radioelektronika atitikmenys: angl. ion implantation mask vok. Ionenimplantationsmaske, f rus. маска для ионной имплантации, f pranc. masque d implantation ionique, m …

    Radioelektronikos terminų žodynas

  • 6jonų implantavimo kaukė — statusas T sritis radioelektronika atitikmenys: angl. ion implantation mask vok. Ionenimplantationsmaske, f rus. маска для ионной имплантации, f pranc. masque d implantation ionique, m …

    Radioelektronikos terminų žodynas

  • 7маска для ионной имплантации — jonų implantavimo kaukė statusas T sritis radioelektronika atitikmenys: angl. ion implantation mask vok. Ionenimplantationsmaske, f rus. маска для ионной имплантации, f pranc. masque d implantation ionique, m …

    Radioelektronikos terminų žodynas

  • 8Self-aligned gate — A self aligned gate is a design arrangement where a highly doped gate in a MOSFET is used as a mask for the doping of the source and drain around it. This technique ensures that the gate will always overlap the edges of the source and drain. The… …

    Wikipedia

  • 9Silvaco — Infobox Company company name = Silvaco International company company type = Private Company| foundation = 1984 location = key people = Dr Ivan Pesic, President/CEO industry = Software Programming homepage = [http://www.silvaco.com/… …

    Wikipedia

  • 10Photolithography — For earlier uses of photolithography in printing, see Lithography. For the same process applied to metal, see Photochemical machining. Photolithography (or optical lithography ) is a process used in microfabrication to selectively remove parts of …

    Wikipedia