high-resolution lithography
1high-resolution lithography — didelės skyros litografija statusas T sritis radioelektronika atitikmenys: angl. high resolution lithography vok. Lithografie mit hoher Auflösung, f rus. литография с высоким разрешением, f; прецизионная литография, f pranc. lithographie à haute… …
2Lithography — Charles Marion Russell s The Custer Fight (1903). Note the range of tones, fading toward the edges …
3lithographie à haute résolution — didelės skyros litografija statusas T sritis radioelektronika atitikmenys: angl. high resolution lithography vok. Lithografie mit hoher Auflösung, f rus. литография с высоким разрешением, f; прецизионная литография, f pranc. lithographie à haute… …
4Electron beam lithography — (often abbreviated as e beam lithography) is the practice of scanning a beam of electrons in a patterned fashion across a surface covered with a film (called the resist),cite book |last= McCord |first=M. A. |coauthors=M. J. Rooks |title=… …
5Nanoimprint lithography — is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint… …
6X-ray lithography — is a next generation lithography that has been developed for the semiconductor industryref|vlad. Batches of microprocessors have already been produced. The short wavelengths of 0.8 nm X rays overcome diffraction limits in the resolution of… …
7Immersion lithography — is a photolithography resolution enhancement technique that replaces the usual air gap between the final lens and the wafer surface with a liquid medium that has a refractive index greater than one. The resolution is increased by a factor equal… …
8Next-generation lithography — (NGL) is a term used in integrated circuit manufacturing to describe the lithography technologies slated to replace photolithography. As of 2009 the most advanced form of photolithography is immersion lithography, in which water is used as an… …
9Extreme ultraviolet lithography — (also known as EUV or EUVL ) is a next generation lithography technology using the 13.5 nm EUV wavelength. EUVL opticsEUVL is a significant departure from the deep ultraviolet lithography used today. All matter absorbs EUV radiation. Hence, EUV… …
10Maskless lithography — In maskless lithography, the radiation that is used to expose a photosensitive emulsion (or photoresist) is not projected from, or transmitted through, a photomask.[1] Instead, most commonly, the radiation is focused to a narrow beam. The beam is …
