gas-flow ionization chamber

  • 41Ames Research Center — Ames Research Center …

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  • 42Electron — For other uses, see Electron (disambiguation). Electron Experiments with a Crookes tube first demonstrated the particle nature of electrons. In this illustration, the profile of the cross shaped target is projected against the tube face at right… …

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  • 43NASA Ames Research Center — (ARC) is a NASA facility located at Moffett Federal Airfield, which covers 43 acres at the borders of the cities of Mountain View and Sunnyvale in California. This research center is most commonly called NASA Ames. The current NASA Ames Center… …

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  • 44Pulsed laser deposition — (PLD) is a thin film deposition (specifically a physical vapor deposition, PVD) technique where a high power pulsed laser beam is focused inside a vacuum chamber to strike a target of the desired composition. Material is then vaporized from the… …

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  • 45atom — /at euhm/, n. 1. Physics. a. the smallest component of an element having the chemical properties of the element, consisting of a nucleus containing combinations of neutrons and protons and one or more electrons bound to the nucleus by electrical… …

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  • 46Helium — otherusesHelium (He) is a colorless, odorless, tasteless, non toxic, inert monatomic chemical element that heads the noble gas group in the periodic table and whose atomic number is 2. Its boiling and melting points are the lowest among the… …

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  • 47Aurora (astronomy) — Aurora Borealis redirects here. For other uses, see Aurora Borealis (disambiguation). Aurora Australis redirects here. For the ship, see Aurora Australis (icebreaker). For the book, see Aurora Australis (book). Northern lights redirects here. For …

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  • 48Oxygen — This article is about the chemical element and its most stable form, O2 or dioxygen. For other forms of this element, see Allotropes of oxygen. For other uses, see Oxygen (disambiguation). nitrogen ← oxygen → fluorine ↑ O ↓ …

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  • 49Plasma scaling — The parameters of plasmas, including their spatial and temporal extent, vary by many orders of magnitude. Nevertheless, there are significant similarities in the behaviors of apparently disparate plasmas. It is not only of theoretical interest to …

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  • 50Plasma-enhanced chemical vapor deposition — PECVD machine at LAAS technological facility in Toulouse, France. Plasma enhanced chemical vapor deposition (PECVD) is a process used to deposit thin films from a gas state (vapor) to a solid state on a substrate. Chemical reactions are involved… …

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