film deposition

  • 121Amateur telescope making — The field of amateur telescope making is considered an offshoot of the amateur astronomy community. Amateur telescope makers (sometimes called ATMs), as their name implies, are not paid professionals. They build their telescopes for the enjoyment …

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  • 122Unsymmetrical dimethylhydrazine — chembox new ImageFileL1 = 1,1 Dimethylhydrazin.svg ImageSizeL1 = 150px ImageFileR1 = 1,1 dimethylhydrazine 3D balls.png ImageSizeR1 = 150px IUPACName = 1,1 Dimethylhydrazine OtherNames = Abbreviations = UDMH Section1 = Chembox Identifiers CASNo …

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  • 123EVP — The abbreviation EVP may refer to:* Enhanced Virus Protection, a feature found in modern AMD processors. * The Evangelical People s Party of Switzerland, a political party. * The Evangelical People s Party, a minor Dutch political party. * The… …

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  • 124Bulk micromachining — is a process used to produce micromachinery or microelectromechanical systems (MEMS).Unlike surface micromachining, which uses a succession of thin film deposition and selective etching, bulk micromachining defines structures by selectively… …

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  • 125Metallizing — is the general name for the technique of coating metal on the surface of non metallic objects. Techniques for metallization started as early as mirror making. In 1835, Justus von Liebig discovered the process of coating a glass surface with… …

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  • 126Mesoporous material — A mesoporous material is a material containing pores with diameters between 2 and 50 nm. Porous materials are classified into several kinds by their size. According to IUPAC notation[1], microporous materials have pore diameters of less than …

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  • 127Norio Taniguchi — (谷口 紀男, Taniguchi Norio?, May 27, 1912 November 15, 1999) was a professor of Tokyo University of Science. He coined the term nano technology in 1974[1] to describe semiconductor processes such as thin film deposition and ion beam milling… …

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  • 128Capacitively coupled plasma — A capacitively coupled plasma (CCP) is one of the most common types of industrial plasma sources. It essentially consists of two metal electrodes separated by a small distance, placed in a reactor. The gas pressure in the reactor can be lower… …

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