etching chemical

  • 11Dry etching — refers to the removal of material, typically a masked pattern of semiconductor material, by exposing the material to a bombardment of ions (usually a plasma of reactive gases such as fluorocarbons, oxygen, chlorine, boron trichloride; sometimes… …

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  • 12Reactive-ion etching — (RIE) is an etching technology used in microfabrication. It uses chemically reactive plasma to remove material deposited on wafers. The plasma is generated under low pressure (vacuum) by an electromagnetic field. High energy ions from the plasma… …

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  • 13Isotropic etching — In semiconductor technology isotropic etching is non directional removal of material from a substrate via a chemical process using an etchant substance. The etchant may be a corrosive liquid or a chemically active ionized gas, known as a… …

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  • 14Reactive-ion etching — Gravure ionique réactive La gravure ionique réactive ou gravure par ions réactifs très souvent appelée par son acronyme anglophone, RIE (pour Reactive Ion Etching), est une technique de gravure sèche des semi conducteurs. Il s agit d une… …

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  • 15Reactive Ion Etching — Gravure ionique réactive La gravure ionique réactive ou gravure par ions réactifs très souvent appelée par son acronyme anglophone, RIE (pour Reactive Ion Etching), est une technique de gravure sèche des semi conducteurs. Il s agit d une… …

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  • 16Wet etching — In microfabrication, wet etching is chemical etching performed with a liquid etchant, as opposed to a plasma. See also Etching (microfabrication) …

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  • 17laser-enhanced chemical etching — lazerinis cheminis ėsdinimas statusas T sritis radioelektronika atitikmenys: angl. laser enhanced chemical etching vok. chemisches Ätzen unter Lasermitwirkung, n rus. химическое травление с помощью лазера, n pranc. décapage chimique à l aide de… …

    Radioelektronikos terminų žodynas

  • 18Plasma etching — is a form of plasma processing used to fabricate integrated circuits. It involves a high speed stream of glow discharge (plasma) of an appropriate gas mixture being shot (in pulses) at a sample. The plasma source, known as etch species, can be… …

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  • 19Photo chemical milling — is a process for manufacturing small parts from flat sheets of metal by chemical etching. The process is begun by cleaning the metal, then applying a thin light activated coating called a photoresist. The coated metal is exposed to a light… …

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  • 20freeze etching — a technique for preparing specimens for electron microscopy. The unfixed tissue is frozen and then split with a knife and a layer of ice is sublimed from the exposed surface. The resultant image is thus not distorted by chemical fixatives …

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