etch trench
1etch trench — ėsdintasis griovelis statusas T sritis radioelektronika atitikmenys: angl. etch groove; etch moat; etch trench vok. Ätzgraben, m rus. вытравленная канавка, f pranc. rainure décapée, f …
2etch groove — ėsdintasis griovelis statusas T sritis radioelektronika atitikmenys: angl. etch groove; etch moat; etch trench vok. Ätzgraben, m rus. вытравленная канавка, f pranc. rainure décapée, f …
3etch moat — ėsdintasis griovelis statusas T sritis radioelektronika atitikmenys: angl. etch groove; etch moat; etch trench vok. Ätzgraben, m rus. вытравленная канавка, f pranc. rainure décapée, f …
4Shallow trench isolation — (STI), also known as Box Isolation Technique , is an integrated circuit feature which prevents electrical current leakage between adjacent semiconductor device components. STI is generally used on CMOS process technology nodes of 250 nanometers… …
5rainure décapée — ėsdintasis griovelis statusas T sritis radioelektronika atitikmenys: angl. etch groove; etch moat; etch trench vok. Ätzgraben, m rus. вытравленная канавка, f pranc. rainure décapée, f …
6Ätzgraben — ėsdintasis griovelis statusas T sritis radioelektronika atitikmenys: angl. etch groove; etch moat; etch trench vok. Ätzgraben, m rus. вытравленная канавка, f pranc. rainure décapée, f …
7ėsdintasis griovelis — statusas T sritis radioelektronika atitikmenys: angl. etch groove; etch moat; etch trench vok. Ätzgraben, m rus. вытравленная канавка, f pranc. rainure décapée, f …
8вытравленная канавка — ėsdintasis griovelis statusas T sritis radioelektronika atitikmenys: angl. etch groove; etch moat; etch trench vok. Ätzgraben, m rus. вытравленная канавка, f pranc. rainure décapée, f …
9Etching (microfabrication) — Etching tanks used to perform Piranha, Hydrofluoric acid or RCA clean on 4 inch wafer batches at LAAS technological facility in Toulouse, France Etching is used in microfabrication to chemically remove layers from the surface of a wafer during… …
10Multiple patterning — is a class of technologies developed for photolithography to enhance the feature density. The simplest case of multiple patterning is double patterning, where a conventional lithography process is enhanced to produce double the expected number of …
