electron-ion emission

  • 41secondary emission — the emission of electrons (secondary electrons) from a material that is bombarded with electrons or ions. [1930 35] * * * ▪ physics       ejection of electrons (electron) from a solid that is bombarded by a beam of charged particles. Some… …

    Universalium

  • 42Field emission microscopy — (FEM) is an analytical technique used in materials science to investigate molecular surface structures and their electronic properties. [cite web | title = Intro to Field Emission | publisher = Field Emission / Ion Microscopy Laboratory, Purdue… …

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  • 43Field Emission Electric Propulsion — (FEEP) is an advanced electrostatic propulsion concept, a form of ion thruster, that uses liquid metal (usually either caesium or indium) as a propellant. A FEEP device consists of an emitter and an accelerator electrode. A potential difference… …

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  • 44Atomic emission spectroscopy — (AES) is a method of chemical analysis that uses the intensity of light emitted from a flame, plasma, arc, or spark at a particular wavelength to determine the quantity of an element in a sample. The wavelength of the atomic spectral line gives… …

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  • 45Helium hydride ion — The hydrohelium(1+) cation, HHe+, is a positively charged ion formed by the reaction of a proton with a helium atom in the gas phase, first observed in 1925. [cite journal | author = T. R. Hogness and E. G. Lunn | title = The Ionization of… …

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  • 46field-emission microscope — noun electron microscope used to observe the surface structure of a solid • Hypernyms: ↑electron microscope * * * /feeld i mish euhn/ a device in which electrons liberated by field emission are accelerated toward a fluorescent screen to form a… …

    Useful english dictionary

  • 47Inductively coupled plasma atomic emission spectroscopy — (ICP AES), also referred to as inductively coupled plasma optical emission spectrometry (ICP OES), is an analytical technique used for the detection of trace metals. It is a type of emission spectroscopy that uses the inductively coupled plasma… …

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  • 48Protonen-Emission — DIN 4844 2 Warnzeichen D W005 Warnung vor radioaktiven Stoffen oder ionisierenden Strahlen (auch auf abschirmenden Behältern)(1) …

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  • 49Gas cluster ion beam — Gas Cluster Ion Beams (GCIB) is a new technology for nano scale modification of surfaces. It can smooth a wide variety of surface material types to within an angstrom of roughness without subsurface damage. It is also used to chemically alter… …

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  • 50Field ion microscope — Field ion microscopy (FIM) is an analytical technique used in materials science. The field ion microscope is a type of microscope that can be used to image the arrangement of atoms at the surface of a sharp metal tip.It was the first technique by …

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