electron-beam mask generator

  • 1Multiple patterning — is a class of technologies developed for photolithography to enhance the feature density. The simplest case of multiple patterning is double patterning, where a conventional lithography process is enhanced to produce double the expected number of …

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  • 2Photoresist — A photoresist is a light sensitive material used in several industrial processes, such as photolithography and photoengraving to form a patterned coating on a surface. Contents 1 Photoresist categories 1.1 Tone 1.2 Developing light wavelength …

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  • 3Extreme ultraviolet lithography — (also known as EUV or EUVL ) is a next generation lithography technology using the 13.5 nm EUV wavelength. EUVL opticsEUVL is a significant departure from the deep ultraviolet lithography used today. All matter absorbs EUV radiation. Hence, EUV… …

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  • 4List of electronics topics — Alphabetization has been neglected in some parts of this article (the b section in particular). You can help by editing it. This is a list of communications, computers, electronic circuits, fiberoptics, microelectronics, medical electronics,… …

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  • 5Radiosurgery — This article is about the medical procedure. For the album by American rock band New Found Glory, see Radiosurgery (album). Radiosurgery Intervention CLINAC: a model of steerable linear accelerator commonly used in radiosurgery …

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  • 6Military equipment of Turkey — The military equipment of Turkey includes a wide array of arms, artilleries, large surface vessels, cannons, armored vehicles, mortars, unmanned vehicles and many different equipments. Contents 1 Historical development 1.1 General 1.2 1923 1950 …

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