direct lithography
1Direct lithography — Прямая плоская печать (без использования офсетного цилиндра) …
2Lithography — Charles Marion Russell s The Custer Fight (1903). Note the range of tones, fading toward the edges …
3direct-write electron-beam lithography — tiesioginė elektronpluoštė litografija statusas T sritis radioelektronika atitikmenys: angl. direct write electron beam lithography vok. Elektronenstrahllithografie für direkte Waferbelichtung, f rus. непосредственная электронно лучевая… …
4Nanoimprint lithography — is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint… …
5Maskless lithography — In maskless lithography, the radiation that is used to expose a photosensitive emulsion (or photoresist) is not projected from, or transmitted through, a photomask.[1] Instead, most commonly, the radiation is focused to a narrow beam. The beam is …
6Contact lithography — Contact lithography, also known as contact printing, is a form of photolithography whereby the image to be printed is obtained by illumination of a photomask in direct contact with a substrate coated with an imaging photoresist layer. Contents 1… …
7X-ray lithography — is a next generation lithography that has been developed for the semiconductor industryref|vlad. Batches of microprocessors have already been produced. The short wavelengths of 0.8 nm X rays overcome diffraction limits in the resolution of… …
8Multiphoton lithography — (also known as direct laser lithography or direct laser writing) of polymer templates has been known for years by the photonic crystal community. Similar to standard photolithography techniques, structuring is accomplished by illuminating… …
9Proximity effect (electron beam lithography) — The proximity effect in electron beam lithography (EBL) is the phenomenon that the exposure dose distribution, and hence the developed pattern, is wider than the scanned pattern, due to the interactions of the primary beam electrons with the… …
10Ion beam lithography — By analogy to E beam lithography, focused ion beam lithography scans an ion beam across a surface to form a pattern. The ion beam may be used for directly sputtering the surface, or may induce chemical reactions in the exposed top layer (resist) …
