cyclotron resonance

  • 121Infrared multiphoton dissociation — Infobox chemical analysis name = Infrared multiphoton dissociation caption = acronym = IRMPD classification = analytes = manufacturers = related = Blackbody infrared radiative dissociation Electron capture dissociation Collision induced… …

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  • 122Electron capture dissociation — In mass spectrometry, electron capture dissociation (ECD) is a method of fragmenting gas phase ions for tandem mass spectrometric analysis (structural elucidation). ECD involves the direct introduction of low energy electrons to trapped gas phase …

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  • 123Blackbody infrared radiative dissociation — Infobox chemical analysis name = Blackbody infrared radiative dissociation caption = acronym = BIRD classification =Mass spectrometry analytes = manufacturers = related = Infrared multiphoton dissociation Collision induced dissociation Electron… …

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  • 124Orbitrap — An orbitrap is a type of mass spectrometer invented by Alexander Makarov. It consists of an outer barrel like electrode and a coaxial inner spindle like electrode that form an electrostatic field with quadro logarithmic potential… …

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  • 125Jozef T. Devreese — is a Belgian scientist, with a long career in condensed matter physics. He is Professor Emeritus of Theoretical Physics at the Universiteit Antwerpen. He obtained a Ph.D. degree in Science, group Physics, Katholieke Universiteit Leuven, 1964.… …

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  • 126Tokamak à configuration variable — The Tokamak à configuration variable ( variable configuration tokamak , TCV) is a research fusion reactor (tokamak) of the École polytechnique fédérale de Lausanne. Its particularity is that its torus section is three times higher than wide. This …

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  • 127Tore Supra — is a French tokamak that began operating after the discontinuation of TFR (Tokamak of Fontenay aux Roses) and of Petula (in Grenoble). Its name comes from the words torus and superconductor, as Tore Supra is the only one of the largest tokamaks… …

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  • 128Plasma-enhanced chemical vapor deposition — PECVD machine at LAAS technological facility in Toulouse, France. Plasma enhanced chemical vapor deposition (PECVD) is a process used to deposit thin films from a gas state (vapor) to a solid state on a substrate. Chemical reactions are involved… …

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