- microfabrication system
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установка для микрообработки
Англо-русский словарь технических терминов. 2005.
microfabrication system
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Etching (microfabrication) — Etching tanks used to perform Piranha, Hydrofluoric acid or RCA clean on 4 inch wafer batches at LAAS technological facility in Toulouse, France Etching is used in microfabrication to chemically remove layers from the surface of a wafer during… … Wikipedia
Process Development Execution System — A Process Development Execution System (PDES) is a system, which is used by companies to perform development activities for high tech manufacturing processes. A PDES is similar to a Manufacturing Execution System (MES) in several aspects. The… … Wikipedia
Nanoelectromechanical system — Part of a series of articles on Nanoelectronics Single molecule electronics … Wikipedia
Photolithography — For earlier uses of photolithography in printing, see Lithography. For the same process applied to metal, see Photochemical machining. Photolithography (or optical lithography ) is a process used in microfabrication to selectively remove parts of … Wikipedia
Two-photon absorption — (TPA) is the simultaneous absorption of two photons of identical or different frequencies in order to excite a molecule from one state (usually the ground state) to a higher energy electronic state. The energy difference between the involved… … Wikipedia
Evaporation (deposition) — Evaporation machine used for metallization at LAAS technological facility in Toulouse, France. Evaporation is a common method of thin film deposition. The source material is evaporated in a vacuum. The vacuum allows vapor particles to travel… … Wikipedia
Boğaziçi University Electrical and Electronics Engineering — Education = The Electrical and Electronics Engineering Department of Bogazici University (BUEE) has stated its educational mission as to provide its students with an excellent undergraduate education to prepare them for successful professional… … Wikipedia
Elektronenstrahllithografie — Die Elektronenstrahllithografie (ESL, englisch electron beam lithography oft als e beam lithography abgekürzt) ist in der Mikro und Halbleitertechnik ein spezielles Verfahren zur Strukturierung einer Elektronenstrahl empfindlichen Schicht… … Deutsch Wikipedia
Dry etching — refers to the removal of material, typically a masked pattern of semiconductor material, by exposing the material to a bombardment of ions (usually a plasma of reactive gases such as fluorocarbons, oxygen, chlorine, boron trichloride; sometimes… … Wikipedia
Martin Yarmush — Martin Maish Yarmush Dr. Martin Yarmush (born October 8, 1952 in Brooklyn, New York), an American scientist, physician, and engineer, is currently the Paul and Mary Monroe Professor of Science and Engineering and Distinguished Professor of… … Wikipedia
Anisotropy — (pronounced with stress on the third syllable, IPAEng|ˌænaɪˈsɒtrəpi) is the property of being directionally dependent, as opposed to isotropy, which means homogeneity in all directions. It can be defined as a difference in a physical property… … Wikipedia
