- mask lithography
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литография, применяемая при изготовлении фотошаблонов
Англо-русский словарь технических терминов. 2005.
mask lithography
Смотреть что такое "mask lithography" в других словарях:
mask lithography — kaukių litografija statusas T sritis radioelektronika atitikmenys: angl. mask lithography vok. Maskenlithografie, f rus. литография шаблонов, f pranc. lithographie de masque, f … Radioelektronikos terminų žodynas
Mask shop — A mask shop is a factory which manufactures photomasks for use in the semiconductor industry. There are two distinct types found in the trade. Captive mask shops are in house operations owned by the biggest semiconductor corporations, while… … Wikipedia
Lithography — Charles Marion Russell s The Custer Fight (1903). Note the range of tones, fading toward the edges … Wikipedia
Mask set — A mask set is a series of electronic data that define geometry for the photolithography steps of semiconductor fabrication. Each of the physical masks generated from this data is called a photomask. A mask set for a modern process typically… … Wikipedia
Contact lithography — Contact lithography, also known as contact printing, is a form of photolithography whereby the image to be printed is obtained by illumination of a photomask in direct contact with a substrate coated with an imaging photoresist layer. Contents 1… … Wikipedia
Computational lithography — (also known as computational scaling) is the set of mathematical and algorithmic approaches designed to improve the resolution attainable through photolithography. Computational lithography has come to the forefront of photolithography in 2008 as … Wikipedia
Next-generation lithography — (NGL) is a term used in integrated circuit manufacturing to describe the lithography technologies slated to replace photolithography. As of 2009 the most advanced form of photolithography is immersion lithography, in which water is used as an… … Wikipedia
Extreme ultraviolet lithography — (also known as EUV or EUVL ) is a next generation lithography technology using the 13.5 nm EUV wavelength. EUVL opticsEUVL is a significant departure from the deep ultraviolet lithography used today. All matter absorbs EUV radiation. Hence, EUV… … Wikipedia
X-ray lithography — is a next generation lithography that has been developed for the semiconductor industryref|vlad. Batches of microprocessors have already been produced. The short wavelengths of 0.8 nm X rays overcome diffraction limits in the resolution of… … Wikipedia
Electron beam lithography — (often abbreviated as e beam lithography) is the practice of scanning a beam of electrons in a patterned fashion across a surface covered with a film (called the resist),cite book |last= McCord |first=M. A. |coauthors=M. J. Rooks |title=… … Wikipedia
Phase-shift mask — Phase shift masks are photomasks that take advantage of the interference generated by phase differences to improve image resolution in photolithography. There exist alternating [cite web|url = http://www.freepatentsonline.com/6977127.html | title … Wikipedia
