- ion-implanted layer
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ионно-имплантированный слой
Англо-русский словарь технических терминов. 2005.
Англо-русский словарь технических терминов. 2005.
ion-implanted layer — jonais implantuotas sluoksnis statusas T sritis radioelektronika atitikmenys: angl. ion implanted layer vok. Ionenimplantationsschicht, f rus. ионно имплантированный слой, m pranc. couche implantée par ions, f … Radioelektronikos terminų žodynas
Ion implantation — is a materials engineering process by which ions of a material can be implanted into another solid, thereby changing the physical properties of the solid. Ion implantation is used in semiconductor device fabrication and in metal finishing, as… … Wikipedia
Ion Beam Mixing — is a process for adhering two multilayers, especially a substrate and deposited surface layer. The process involves bombarding layered samples with doses of ion radiation in order to promote mixing at the interface, and generally serves as a… … Wikipedia
Focused ion beam — Focused ion beam, also known as FIB, is a technique used particularly in the semiconductor and materials science fields for site specific analysis, deposition, and ablation of materials. The FIB is a scientific instrument that resembles a… … Wikipedia
Ionenimplantationsschicht — jonais implantuotas sluoksnis statusas T sritis radioelektronika atitikmenys: angl. ion implanted layer vok. Ionenimplantationsschicht, f rus. ионно имплантированный слой, m pranc. couche implantée par ions, f … Radioelektronikos terminų žodynas
couche implantée par ions — jonais implantuotas sluoksnis statusas T sritis radioelektronika atitikmenys: angl. ion implanted layer vok. Ionenimplantationsschicht, f rus. ионно имплантированный слой, m pranc. couche implantée par ions, f … Radioelektronikos terminų žodynas
jonais implantuotas sluoksnis — statusas T sritis radioelektronika atitikmenys: angl. ion implanted layer vok. Ionenimplantationsschicht, f rus. ионно имплантированный слой, m pranc. couche implantée par ions, f … Radioelektronikos terminų žodynas
ионно-имплантированный слой — jonais implantuotas sluoksnis statusas T sritis radioelektronika atitikmenys: angl. ion implanted layer vok. Ionenimplantationsschicht, f rus. ионно имплантированный слой, m pranc. couche implantée par ions, f … Radioelektronikos terminų žodynas
Vertical-cavity surface-emitting laser — The vertical cavity surface emitting laser (VCSEL; [v ɪxl] ) is a type of semiconductor laser diode with laser beam emission perpendicular from the top surface, contrary to conventional edge emitting semiconductor lasers (also in plane lasers)… … Wikipedia
Nitriding — is a heat treating process that diffuses nitrogen into the surface of a metal to create a case hardened surface. It is predominantly used on steel, but also titanium, aluminum and molybdenum. Typical applications include gears, crankshafts,… … Wikipedia
Charge-coupled device — A specially developed CCD used for ultraviolet imaging in a wire bonded package. A charge coupled device (CCD) is a device for the movement of electrical charge, usually from within the device to an area where the charge can be manipulated, for… … Wikipedia