- electron-beam patterning
-
формирование рисунка методом электронно-лучевой литографии
Англо-русский словарь технических терминов. 2005.
electron-beam patterning
Смотреть что такое "electron-beam patterning" в других словарях:
Electron beam lithography — (often abbreviated as e beam lithography) is the practice of scanning a beam of electrons in a patterned fashion across a surface covered with a film (called the resist),cite book |last= McCord |first=M. A. |coauthors=M. J. Rooks |title=… … Wikipedia
Multiple patterning — is a class of technologies developed for photolithography to enhance the feature density. The simplest case of multiple patterning is double patterning, where a conventional lithography process is enhanced to produce double the expected number of … Wikipedia
Double patterning — is a class of technologies developed for photolithography to enhance the feature density. For the semiconductor industry, double patterning is the only lithography technique to be used for the 32 nm and 22 nm half pitch nodes in 2008 2009 and… … Wikipedia
Elektronenstrahllithografie — Die Elektronenstrahllithografie (ESL, englisch electron beam lithography oft als e beam lithography abgekürzt) ist in der Mikro und Halbleitertechnik ein spezielles Verfahren zur Strukturierung einer Elektronenstrahl empfindlichen Schicht… … Deutsch Wikipedia
Microelectromechanical systems — (MEMS) (also written as micro electro mechanical, MicroElectroMechanical or microelectronic and microelectromechanical systems) is the technology of very small mechanical devices driven by electricity; it merges at the nano scale into… … Wikipedia
Dip-pen nanolithography — (DPN) began as a scanning probe lithography technique where an atomic force microscope tip was used to transfer alkane thiolates to a gold surface. This technique allows surface patterning on scales of under 100 nanometers. DPN is the… … Wikipedia
Maskless lithography — In maskless lithography, the radiation that is used to expose a photosensitive emulsion (or photoresist) is not projected from, or transmitted through, a photomask.[1] Instead, most commonly, the radiation is focused to a narrow beam. The beam is … Wikipedia
nanotechnology — /nan euh tek nol euh jee, nay neuh /, n. any technology on the scale of nanometers. [1987] * * * Manipulation of atoms, molecules, and materials to form structures on the scale of nanometres (billionths of a metre). These nanostructures typically … Universalium
Nanolithography — Part of a series of articles on Nanoelectronics Single molecule electronics … Wikipedia
Interference lithography — (or holographic lithography) is a technique for patterning regular arrays of fine features, without the use of complex optical systems or photomasks. Basic principleThe basic principle is the same as in interferometry or holography. An… … Wikipedia
Nanoimprint lithography — is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint… … Wikipedia
