- plasma-deposited coating
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покрытие, наносимое вакуум-плазменным осаждением
Англо-русский словарь технических терминов. 2005.
plasma-deposited coating
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Plasma electrolytic oxidation — (PEO), also known as microarc oxidation (MAO), is an electrochemical surface treatment process for generating oxide coatings on metals. It is similar to anodizing, but it employs higher potentials, so that discharges[1] occur and the resulting… … Wikipedia
Plasma Spray — Plasma spraying, a method of thermal spraying, is a materials processing technique for producing coatings and free standing parts using a plasma jet. Deposits having thickness from micrometers to several millimeters can be produced from a variety … Wikipedia
Solution precursor plasma spray — (SPPS) is a thermal spray process where a feedstock solution is heated and then deposited onto a substrate. Basic properties of the process are fundamentally similar to other plasma spraying processes. However, instead of injecting a powder into… … Wikipedia
Thin film — A thin film is a layer of material ranging from fractions of a nanometer (monolayer) to several micrometers in thickness. Electronic semiconductor devices and optical coatings are the main applications benefiting from thin film construction. A… … Wikipedia
Chemical vapor deposition — DC plasma (violet) enhances the growth of carbon nanotubes in this laboratory scale PECVD apparatus. Chemical vapor deposition (CVD) is a chemical process used to produce high purity, high performance solid materials. The process is often used in … Wikipedia
Sputter deposition — is a physical vapor deposition (PVD) method of depositing thin films by sputtering, that is ejecting, material from a target, that is source, which then deposits onto a substrate, such as a silicon wafer. Resputtering is re emission of the… … Wikipedia
Nanoparticle — In nanotechnology, a particle is defined as a small object that behaves as a whole unit in terms of its transport and properties. Particles are further classified according to size[1] : in terms of diameter, coarse particles cover a range… … Wikipedia
Thin-film deposition — is any technique for depositing a thin film of material onto a substrate or onto previously deposited layers. Thin is a relative term, but most deposition techniques allow layer thickness to be controlled within a few tens of nanometers, and some … Wikipedia
radiation — radiational, adj. /ray dee ay sheuhn/, n. 1. Physics. a. the process in which energy is emitted as particles or waves. b. the complete process in which energy is emitted by one body, transmitted through an intervening medium or space, and… … Universalium
Substrate (materials science) — Substrate is a term used in materials science to describe the base material on which processing is conducted to produce new film or layers of material such as deposited coatings. A typical substrate might be a metal, onto which a coating might be … Wikipedia
High Power Impulse Magnetron Sputtering — (HIPIMS, also known as High Impact Power Magnetron Sputtering and High Power Pulsed Magnetron Sputtering, HPPMS) is a method for physical vapor deposition of thin films which is based on magnetron sputter deposition. HIPIMS utilises extremely… … Wikipedia
