- plasma(-etch) photoresist
-
фоторезист для плазменного травления
Англо-русский словарь технических терминов. 2005.
plasma(-etch) photoresist
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RIE-Prozess — Plasmaätzen ist ein materialabtragendes, plasmaunterstütztes, gaschemisches Trockenätz Verfahren, das besonders in der Halbleitertechnik, Mikrostrukturtechnologie und in der Displaytechnik großtechnisch eingesetzt wird. Der Begriff Plasmaätzen… … Deutsch Wikipedia
