plasma deposited silicon

plasma deposited silicon
кремний, полученный плазменным осаждением

Англо-русский словарь технических терминов. 2005.

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  • Plasma-enhanced chemical vapor deposition — PECVD machine at LAAS technological facility in Toulouse, France. Plasma enhanced chemical vapor deposition (PECVD) is a process used to deposit thin films from a gas state (vapor) to a solid state on a substrate. Chemical reactions are involved… …   Wikipedia

  • Silicon nitride — Preferred IUPAC name Silicon nitride …   Wikipedia

  • Plasma Enhanced Chemical Vapour Deposition — Plasma Enhanced Chemical Vapour Deposition, PECVD or sometimes PCVD, is the process by which chemicals are deposited onto a substrate using a Radio Frequency (RF) Plasma to split the precursors into active ions.TheoryPrecursor chemical enter the… …   Wikipedia

  • Plasma electrolytic oxidation — (PEO), also known as microarc oxidation (MAO), is an electrochemical surface treatment process for generating oxide coatings on metals. It is similar to anodizing, but it employs higher potentials, so that discharges[1] occur and the resulting… …   Wikipedia

  • Plasma etcher — A plasma etcher, or etching tool, is a tool used in the production of semiconductor devices. Plasma etcher produces a plasma from a process gas, typically oxygen or a fluorine bearing gas, using a high frequency electric field, typically 13.56… …   Wikipedia

  • Polycrystalline silicon — Polycrystalline silicon, also called polysilicon, is a material consisting of small silicon crystals. It differs from single crystal silicon, used for electronics and solar cells, and from amorphous silicon, used for thin film devices and solar… …   Wikipedia

  • Solution precursor plasma spray — (SPPS) is a thermal spray process where a feedstock solution is heated and then deposited onto a substrate. Basic properties of the process are fundamentally similar to other plasma spraying processes. However, instead of injecting a powder into… …   Wikipedia

  • Crystalline silicon — is a material consisting of one or more small silicon crystals. Polycrystalline silicon Polycrystalline silicon (or polysilicon, poly Si, or simply poly in context) is a material consisting of multiple small silicon crystals.Polycrystalline… …   Wikipedia

  • Synthetic diamond — Synthetic diamonds of various colors grown by the high pressure high temperature technique Synthetic diamond is diamond produced in a technological process; as opposed to natural diamond, which is created in geological processes. Synthetic… …   Wikipedia

  • Combustion chemical vapor deposition — (CCVD) is a chemical process by which thin film coatings are deposited onto substrates in the open atmosphere. Contents 1 History 2 Principles and procedure 3 Remote combustion chemical v …   Wikipedia

  • Field electron emission — It is requested that a diagram or diagrams be included in this article to improve its quality. For more information, refer to discussion on this page and/or the listing at Wikipedia:Requested images. Field emission (FE) (also known as field… …   Wikipedia


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