- multiple photomask
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мультиплицированный фотошаблон
Англо-русский словарь технических терминов. 2005.
multiple photomask
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Optical proximity correction — An illustration of optical proximity correction. The blue Γ like shape is what we d like printed on the wafer, in green is the shape after applying optical proximity correction, and the red contour is how the shape actually prints (quite close to … Wikipedia
Contact lithography — Contact lithography, also known as contact printing, is a form of photolithography whereby the image to be printed is obtained by illumination of a photomask in direct contact with a substrate coated with an imaging photoresist layer. Contents 1… … Wikipedia
Fiber Bragg grating — A fiber Bragg grating (FBG) is a type of distributed Bragg reflector constructed in a short segment of optical fiber that reflects particular wavelengths of light and transmits all others. This is achieved by adding a periodic variation to the… … Wikipedia
Photolithography — For earlier uses of photolithography in printing, see Lithography. For the same process applied to metal, see Photochemical machining. Photolithography (or optical lithography ) is a process used in microfabrication to selectively remove parts of … Wikipedia
Printed circuit board — Part of a 1983 Sinclair ZX Spectrum computer board; a populated PCB, showing the conductive traces, vias (the through hole paths to the other surface), and some mounted electrical components A printed circuit board, or PCB, is used to… … Wikipedia
Maskless lithography — In maskless lithography, the radiation that is used to expose a photosensitive emulsion (or photoresist) is not projected from, or transmitted through, a photomask.[1] Instead, most commonly, the radiation is focused to a narrow beam. The beam is … Wikipedia
Resist — is also an album by Kosheen and a song by Rush. In semiconductor fabrication, resist refers to both: # A thin layer used to transfer a circuit pattern to the semiconductor substrate which it is deposited upon. A resist can be patterned via… … Wikipedia
Dip-pen nanolithography — (DPN) began as a scanning probe lithography technique where an atomic force microscope tip was used to transfer alkane thiolates to a gold surface. This technique allows surface patterning on scales of under 100 nanometers. DPN is the… … Wikipedia
Electronic design automation — (EDA) is the category of tools for designing and producing electronic systems ranging from printed circuit boards (PCBs) to integrated circuits. This is sometimes referred to as ECAD (electronic computer aided design) or just CAD. (Printed… … Wikipedia
Micro contact printing — Figure 1: PDMS master is created by patterning silicon, pouring and curing the PDMS, and peeling away from the substrate … Wikipedia
CPU design — is the design engineering task of creating a central processing unit (CPU), a component of computer hardware. It is a subfield of electronics engineering and computer engineering. Contents 1 Overview 2 Goals 3 Performance analysis and… … Wikipedia
