solid-film photoresist

solid-film photoresist
сухой пленочный фоторезист

Большой англо-русский и русско-английский словарь. 2001.

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  • Photoresist — A photoresist is a light sensitive material used in several industrial processes, such as photolithography and photoengraving to form a patterned coating on a surface. Contents 1 Photoresist categories 1.1 Tone 1.2 Developing light wavelength …   Wikipedia

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  • Multiple patterning — is a class of technologies developed for photolithography to enhance the feature density. The simplest case of multiple patterning is double patterning, where a conventional lithography process is enhanced to produce double the expected number of …   Wikipedia

  • Double patterning — is a class of technologies developed for photolithography to enhance the feature density. For the semiconductor industry, double patterning is the only lithography technique to be used for the 32 nm and 22 nm half pitch nodes in 2008 2009 and… …   Wikipedia

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  • Extreme ultraviolet lithography — (also known as EUV or EUVL ) is a next generation lithography technology using the 13.5 nm EUV wavelength. EUVL opticsEUVL is a significant departure from the deep ultraviolet lithography used today. All matter absorbs EUV radiation. Hence, EUV… …   Wikipedia

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  • Color filter array — The Bayer color filter mosaic. Each two by two submosaic contains 2 green, 1 blue and 1 red filter, each covering one pixel sensor. In photography, a color filter array (CFA), or color filter mosaic (CFM), is a mosaic of tiny color filters placed …   Wikipedia


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