dry ashing technique
1Semiconductor device fabrication — Semiconductor manufacturing processes 10 µm 1971 3 µm 1975 1.5 µm 1982 …
2Photolithography — For earlier uses of photolithography in printing, see Lithography. For the same process applied to metal, see Photochemical machining. Photolithography (or optical lithography ) is a process used in microfabrication to selectively remove parts of …
3sample preparation — ▪ chemistry Introduction in analytical chemistry (chemistry), the processes in which a representative piece of material is extracted from a larger amount and readied for analysis. Sampling and sample preparation have a unique meaning and special …
4Etching (microfabrication) — Etching tanks used to perform Piranha, Hydrofluoric acid or RCA clean on 4 inch wafer batches at LAAS technological facility in Toulouse, France Etching is used in microfabrication to chemically remove layers from the surface of a wafer during… …
5Inductively coupled plasma atomic emission spectroscopy — (ICP AES), also referred to as inductively coupled plasma optical emission spectrometry (ICP OES), is an analytical technique used for the detection of trace metals. It is a type of emission spectroscopy that uses the inductively coupled plasma… …
