- Chemical vapor deposition (CVD)
- Chemical vapor deposition (CVD).(Источник: «Металлы и сплавы. Справочник.» Под редакцией Ю.П. Солнцева; НПО "Профессионал", НПО "Мир и семья"; Санкт-Петербург, 2003 г.)
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Chemical vapor deposition (CVD)
Смотреть что такое "Chemical vapor deposition (CVD)" в других словарях:
Chemical vapor deposition of ruthenium — is a method to deposit thin layers of ruthenium on substrate by Chemical vapor deposition (CVD). A unique challenge arises in trying to grow impurity free films of a catalyst in Chemical vapor deposition (CVD). Ruthenium metal activates C H and C … Wikipedia
chemical vapor deposition — Chemical Vapor Deposition (CVD) Химическое осаждение из паровой фазы Метод нанесения покрытий, в котором химические вещества сначала испаряются, а затем осаждаются на поверхность с помощью инертного газа носителя, такого как азот. Например,… … Толковый англо-русский словарь по нанотехнологии. - М.
Chemical vapor deposition — DC plasma (violet) enhances the growth of carbon nanotubes in this laboratory scale PECVD apparatus. Chemical vapor deposition (CVD) is a chemical process used to produce high purity, high performance solid materials. The process is often used in … Wikipedia
Chemical vapor deposition — Unter dem Begriff chemische Gasphasenabscheidung (englisch chemical vapor deposition, CVD) versteht man eine Gruppe von Beschichtungsverfahren, welche unter anderem bei der Herstellung von mikroelektronischen Bauelementen eingesetzt werden.… … Deutsch Wikipedia
Chemical Vapor Deposition (journal) — Chemical Vapor Deposition Titre abrégé Chem. Vap. Deposition CVD Discipline … Wikipédia en Français
Chemical Vapor Deposition (journal) — Abbreviated title (ISO) Chem. Vap. Depo … Wikipedia
Chemical vapor deposition of diamond — Colorless gem cut from diamond grown by chemical vapor deposition Chemical vapor deposition of diamond or CVD is a method of producing synthetic diamond by creating the circumstances necessary for carbon atoms in a gas to settle on a substrate in … Wikipedia
Hybrid Physical-Chemical Vapor Deposition — (HPCVD) is a thin film deposition technique that combines physical vapor deposition (PVD) with chemical vapor deposition (CVD). For the instance of magnesium diboride (MgB2) thin film growth, HPCVD process uses diborane (B2H6) as the boron… … Wikipedia
Combustion chemical vapor deposition — (CCVD) is a chemical process by which thin film coatings are deposited onto substrates in the open atmosphere. Contents 1 History 2 Principles and procedure 3 Remote combustion chemical v … Wikipedia
Chemical vapor infiltration — (CVI) is a variant on Chemical Vapor Deposition (CVD). CVD implies deposition onto a surface, whereas CVI implies deposition within a body. Chemical vapor infiltration is widely used as a means of fabricating Ceramic Matrix Composites (CMCs) such … Wikipedia
